1 Ocak 2022 Dergi makalesi Açık Erişim

Gursoy, Mehmet; Citak, Emre; Karaman, Mustafa

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{
  "@context": "https://schema.org/", 
  "@id": 239280, 
  "@type": "ScholarlyArticle", 
  "creator": [
    {
      "@type": "Person", 
      "name": "Gursoy, Mehmet"
    }, 
    {
      "@type": "Person", 
      "affiliation": "Konya Tech Univ, Dept Chem Engn, TR-42030 Konya, Turkey", 
      "name": "Citak, Emre"
    }, 
    {
      "@type": "Person", 
      "name": "Karaman, Mustafa"
    }
  ], 
  "datePublished": "2022-01-01", 
  "description": "Large-area graphene of the order of centimeters was deposited on copper substrates by low-pressure chemical vapor deposition (LPCVD) using hexane as the carbon source. The effect of temperature and the carrier gas flowrates on the quality and uniformity of the as-deposited graphene was investigated using the Raman analysis. The film deposited at 870 degrees C with a total carrier gas flowrate of 50 sccm is predominantly single-layer with very low defects according to the Raman spectra. The 2D/G peak intensity ratios obtained from the Raman spectra of samples from three different locations of graphene deposited on a whole copper catalyst was used to calculate the large-area uniformity. Based on the results, a very high uniformity of 89.6% was calculated for the graphene deposited at 870 degrees C. The uniformity was observed to decrease with increasing temperature. Similar to the thickness uniformity, the electrical conductivity values obtained as a result of I-V measurements and water contact angle measurements were found to be close to each other for the graphene deposited under the same deposition conditions.", 
  "headline": "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique", 
  "identifier": 239280, 
  "image": "https://aperta.ulakbim.gov.tr/static/img/logo/aperta_logo_with_icon.svg", 
  "license": "http://www.opendefinition.org/licenses/cc-by", 
  "name": "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique", 
  "url": "https://aperta.ulakbim.gov.tr/record/239280"
}