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Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Gursoy, Mehmet; Citak, Emre; Karaman, Mustafa


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        "name": "Gursoy, Mehmet"
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        "affiliation": "Konya Tech Univ, Dept Chem Engn, TR-42030 Konya, Turkey", 
        "name": "Citak, Emre"
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      {
        "name": "Karaman, Mustafa"
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    "description": "Large-area graphene of the order of centimeters was deposited on copper substrates by low-pressure chemical vapor deposition (LPCVD) using hexane as the carbon source. The effect of temperature and the carrier gas flowrates on the quality and uniformity of the as-deposited graphene was investigated using the Raman analysis. The film deposited at 870 degrees C with a total carrier gas flowrate of 50 sccm is predominantly single-layer with very low defects according to the Raman spectra. The 2D/G peak intensity ratios obtained from the Raman spectra of samples from three different locations of graphene deposited on a whole copper catalyst was used to calculate the large-area uniformity. Based on the results, a very high uniformity of 89.6% was calculated for the graphene deposited at 870 degrees C. The uniformity was observed to decrease with increasing temperature. Similar to the thickness uniformity, the electrical conductivity values obtained as a result of I-V measurements and water contact angle measurements were found to be close to each other for the graphene deposited under the same deposition conditions.", 
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