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Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Gursoy, Mehmet; Citak, Emre; Karaman, Mustafa


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{
  "DOI": "10.1007/s42823-021-00309-3", 
  "abstract": "Large-area graphene of the order of centimeters was deposited on copper substrates by low-pressure chemical vapor deposition (LPCVD) using hexane as the carbon source. The effect of temperature and the carrier gas flowrates on the quality and uniformity of the as-deposited graphene was investigated using the Raman analysis. The film deposited at 870 degrees C with a total carrier gas flowrate of 50 sccm is predominantly single-layer with very low defects according to the Raman spectra. The 2D/G peak intensity ratios obtained from the Raman spectra of samples from three different locations of graphene deposited on a whole copper catalyst was used to calculate the large-area uniformity. Based on the results, a very high uniformity of 89.6% was calculated for the graphene deposited at 870 degrees C. The uniformity was observed to decrease with increasing temperature. Similar to the thickness uniformity, the electrical conductivity values obtained as a result of I-V measurements and water contact angle measurements were found to be close to each other for the graphene deposited under the same deposition conditions.", 
  "author": [
    {
      "family": "Gursoy", 
      "given": " Mehmet"
    }, 
    {
      "family": "Citak", 
      "given": " Emre"
    }, 
    {
      "family": "Karaman", 
      "given": " Mustafa"
    }
  ], 
  "container_title": "CARBON LETTERS", 
  "id": "239280", 
  "issue": "3", 
  "issued": {
    "date-parts": [
      [
        2022, 
        1, 
        1
      ]
    ]
  }, 
  "page": "781-787", 
  "title": "Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique", 
  "type": "article-journal", 
  "volume": "32"
}
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