1 Ocak 2021 Dergi makalesi Açık Erişim

Kutlu-Narin, Ece; Narin, Polat; Lisesivdin, Sefer Bora; Sarikavak-Lisesivdin, Beyza

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{
  "@context": "https://schema.org/", 
  "@id": 238622, 
  "@type": "ScholarlyArticle", 
  "creator": [
    {
      "@type": "Person", 
      "affiliation": "Ankara Univ, Fac Engn, Dept Phys Engn, TR-06100 Ankara, Turkey", 
      "name": "Kutlu-Narin, Ece"
    }, 
    {
      "@type": "Person", 
      "name": "Narin, Polat"
    }, 
    {
      "@type": "Person", 
      "affiliation": "Gazi Univ, Fac Sci, Dept Phys, TR-06500 Ankara, Turkey", 
      "name": "Lisesivdin, Sefer Bora"
    }, 
    {
      "@type": "Person", 
      "affiliation": "Gazi Univ, Fac Sci, Dept Phys, TR-06500 Ankara, Turkey", 
      "name": "Sarikavak-Lisesivdin, Beyza"
    }
  ], 
  "datePublished": "2021-01-01", 
  "description": "This study focuses on the growth and physical properties of ZnO thin films on different substrates grown by mist-CVD enhanced with ozone (O-3) gas produced by corona discharge plasma using O-2. Here, O-3 is used to eliminate the defects related to oxygen in ZnO thin films. ZnO thin films are grown on amorphous soda-lime glass (SLG) and single crystals SiO2/Si (100) and c-plane Al2O3 substrates at 350 degrees C of low growth temperature. All ZnO thin films show dominant (0002) diffraction peaks from X-ray diffraction (XRD). As expected, full width at half maximum (FWHM) of (0002) is decreasing in ZnO thin films on single-crystal substrates, especially c-Al2O3 due to similar crystal structure. It is found that the strain in the films is lowest in ZnO/c-Al2O3. The surface morphologies of the thin films are studied with atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurements. Grown ZnO films have a hexagonal and triangular nanostructure with different nanostructure sizes depending on the used substrate types. The calculated surface roughness is dramatically decreased in ZnO/c-Al2O3 compared to the other grown structures. The confocal Raman measurements show the E-2(H) peak of ZnO thin films at 437 cm(-1). It is suggested that O-3 gas produced by corona discharge plasma using O-2 can be useful to obtain better crystal quality and physical properties in ZnO thin films.", 
  "headline": "Investigation of Structural and Optical Properties of ZnO Thin Films Grown on Different Substrates by Mist-CVD Enhanced with Ozone Gas Produced by Corona Discharge Plasma", 
  "identifier": 238622, 
  "image": "https://aperta.ulakbim.gov.tr/static/img/logo/aperta_logo_with_icon.svg", 
  "license": "http://www.opendefinition.org/licenses/cc-by", 
  "name": "Investigation of Structural and Optical Properties of ZnO Thin Films Grown on Different Substrates by Mist-CVD Enhanced with Ozone Gas Produced by Corona Discharge Plasma", 
  "url": "https://aperta.ulakbim.gov.tr/record/238622"
}