1 Ocak 2020 Dergi makalesi Açık Erişim

Angay, Firat; Loefler, Lukas; Tetard, Florent; Eyidi, Dominique; Djemia, Philippe; Holec, David; Abadias, Gregory

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        "affiliation": "Univ Poitiers, Inst Porime, UPR 3346, CNRS,ENSMA, 11 Blvd Marie & Pierre Curie,TSA 41123, F-86073 Poitiers 9, France", 
        "name": "Angay, Firat"
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      {
        "affiliation": "Univ Leoben, Dept Mat Sci, Franz Josef Str 18, A-8700 Leoben, Austria", 
        "name": "Loefler, Lukas"
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      {
        "affiliation": "Univ Sorbonne Paris Nord, Lab Sci Proc & Mat, UPR 3407, Alliance Sorbonne Paris Cite,CNRS, 99 Ave JB Clement, F-93430 Villetaneuse, France", 
        "name": "Tetard, Florent"
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      {
        "affiliation": "Univ Poitiers, Inst Porime, UPR 3346, CNRS,ENSMA, 11 Blvd Marie & Pierre Curie,TSA 41123, F-86073 Poitiers 9, France", 
        "name": "Eyidi, Dominique"
      }, 
      {
        "affiliation": "Univ Sorbonne Paris Nord, Lab Sci Proc & Mat, UPR 3407, Alliance Sorbonne Paris Cite,CNRS, 99 Ave JB Clement, F-93430 Villetaneuse, France", 
        "name": "Djemia, Philippe"
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      {
        "affiliation": "Univ Leoben, Dept Mat Sci, Franz Josef Str 18, A-8700 Leoben, Austria", 
        "name": "Holec, David"
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      {
        "affiliation": "Univ Poitiers, Inst Porime, UPR 3346, CNRS,ENSMA, 11 Blvd Marie & Pierre Curie,TSA 41123, F-86073 Poitiers 9, France", 
        "name": "Abadias, Gregory"
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    "description": "In this work, the structural and mechanical properties of ternary Mo-Al-N alloys are investigated by combining thin film growth experiments and density functional theory (DFT) calculations. Mo1-xAlxNy thin films (similar to 300 nm thick), with various Al fractions ranging from x = 0 to 0.5 and nitrogen-to-metal (Al + Mo) ratio ranging from y = 0.78 to 1.38, were deposited by direct-current reactive magnetron cosputtering technique from elemental Mo and Al targets under Ar + N-2 plasma discharges. The Al content was varied by changing the respective Mo and Al target powers, at a fixed N-2 (20 SCCM) and Ar (25 SCCM) flow rate, and using two different substrate temperatures T-s = 350 and 500 degrees C. The elemental composition, mass density, crystal structure, residual stress state, and intrinsic (growth) stress were examined by wavelength dispersive x-ray spectroscopy, x-ray reflectivity, x-ray diffraction, including pole figure and sin2(psi) measurements, and real-time in situ wafer curvature. Nanoindentation tests were carried out to determine film hardness H and elastic modulus E-IT, while the shear elastic constant C-44 was measured selectively by surface Brillouin light spectroscopy. All deposited Mo1-xAlxNy films have a cubic rock-salt crystal structure and exhibit a fiber-texture with a [001] preferred orientation. The incorporation of Al is accompanied by a rise in nitrogen content from 44 to 58 at. %, resulting in a significant increase (2%) in the lattice parameter when x increases from 0 to 0.27. This trend is opposite to what DFT calculations predict for cubic defect-free stoichiometric Mo1-xAlxN compounds and is attributed to variation in point defect concentration (nitrogen and metal vacancies) when Al substitutes for Mo. Increasing T-s from 350 to 500 degrees C has a minimal effect on the structural properties and phase composition of the ternary alloys but concurs to an appreciable reduction of the compressive stress from -5 to -4 GPa. A continuous increase and decrease in transverse sound velocity and mass density, respectively, lead to a moderate stiffening of the shear elastic constant from 130 to 144 GPa with increasing Al fraction up to x = 0.50, and a complex and nonmonotonous variation of H and E-IT is observed. The maximum hardness of similar to 33GPa is found for the Mo0.81Al0.19N1.13 film, with nitrogen content close to the stoichiometric composition. The experimental findings are explained based on structural and elastic constant values computed from DFT for defect-free and metal- or nitrogen-deficient rock-salt MoAlN compounds.", 
    "doi": "10.1116/6.0000292", 
    "has_grant": false, 
    "journal": {
      "issue": "5", 
      "title": "JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A", 
      "volume": "38"
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    "license": {
      "id": "cc-by"
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    "publication_date": "2020-01-01", 
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    "title": "Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects"
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