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Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Angay, Firat; Loefler, Lukas; Tetard, Florent; Eyidi, Dominique; Djemia, Philippe; Holec, David; Abadias, Gregory


BibTeX

@article{angay_firat_2020_6229,
  author       = {Angay, Firat and
                  Loefler, Lukas and
                  Tetard, Florent and
                  Eyidi, Dominique and
                  Djemia, Philippe and
                  Holec, David and
                  Abadias, Gregory},
  title        = {{Structure, stress, and mechanical properties of 
                   Mo-Al-N thin films deposited by dc reactive
                   magnetron cosputtering: Role of point defects}},
  journal      = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A},
  year         = 2020,
  volume       = 38,
  number       = 5,
  month        = jan,
}
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