1 Ocak 2017 Dergi makalesi Açık Erişim

Zhang, H.; Chiappe, D.; Meersschaut, J.; Conard, T.; Franquet, A.; Nuytten, T.; Mannarino, M.; Radu, I.; Vandervorst, W.; Delabie, A.

BibTeX

@article{zhang_h_2017_45745,
  author       = {Zhang, H. and
                  Chiappe, D. and
                  Meersschaut, J. and
                  Conard, T. and
                  Franquet, A. and
                  Nuytten, T. and
                  Mannarino, M. and
                  Radu, I. and
                  Vandervorst, W. and
                  Delabie, A.},
  title        = {{Nucleation and growth mechanisms of Al2O3 atomic 
                   layer deposition on synthetic polycrystalline MoS2}},
  journal      = {JOURNAL OF CHEMICAL PHYSICS},
  year         = 2017,
  volume       = 146,
  number       = 5,
  month        = jan,
}