Dergi makalesi Açık Erişim
Goktas, Oktay; Cakiroglu, Dilek; Yildirim, Ozal; Goktas, Nebile Isik
@article{goktas_oktay_2018_36965, author = {Goktas, Oktay and Cakiroglu, Dilek and Yildirim, Ozal and Goktas, Nebile Isik}, title = {{Investigation of dose and development time for thin e-beam resist poly(methyl methacrylate) for large area dense nanopattern applications}}, journal = {INTERNATIONAL JOURNAL OF NANOTECHNOLOGY}, year = 2018, volume = 15, number = {8-10}, pages = {663-668}, month = jan, }
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Goktas, O., Cakiroglu, D., Yildirim, O. ve Goktas, N. I. (2018). Investigation of dose and development time for thin e-beam resist poly(methyl methacrylate) for large area dense nanopattern applications. INTERNATIONAL JOURNAL OF NANOTECHNOLOGY, 15(8-10), 663–668. https://aperta.ulakbim.gov.tr/record/36965 adresinden erişildi.