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Investigation of dose and development time for thin e-beam resist poly(methyl methacrylate) for large area dense nanopattern applications

Goktas, Oktay; Cakiroglu, Dilek; Yildirim, Ozal; Goktas, Nebile Isik


BibTeX

@article{goktas_oktay_2018_36965,
  author       = {Goktas, Oktay and
                  Cakiroglu, Dilek and
                  Yildirim, Ozal and
                  Goktas, Nebile Isik},
  title        = {{Investigation of dose and development time for 
                   thin e-beam resist poly(methyl methacrylate) for
                   large area dense nanopattern applications}},
  journal      = {INTERNATIONAL JOURNAL OF NANOTECHNOLOGY},
  year         = 2018,
  volume       = 15,
  number       = {8-10},
  pages        = {663-668},
  month        = jan,
}
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Alıntı yap

Goktas, O., Cakiroglu, D., Yildirim, O. ve Goktas, N. I. (2018). Investigation of dose and development time for thin e-beam resist poly(methyl methacrylate) for large area dense nanopattern applications. INTERNATIONAL JOURNAL OF NANOTECHNOLOGY, 15(8-10), 663–668. https://aperta.ulakbim.gov.tr/record/36965 adresinden erişildi.

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