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Influence of N-2/H-2 and N-2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition

Alevli, Mustafa; Gungor, Nese


BibTeX

@article{alevli_mustafa_2018_30199,
  author       = {Alevli, Mustafa and
                  Gungor, Nese},
  title        = {{Influence of N-2/H-2 and N-2 plasma on binary III- 
                   nitride films prepared by hollow-cathode plasma-
                   assisted atomic layer deposition}},
  journal      = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A},
  year         = 2018,
  volume       = 36,
  number       = 1,
  month        = jan,
}
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