Comparative effects of Cu (60-80 nm) and CuO (40 nm) nanoparticles in Artemia salina: Accumulation, elimination and oxidative stress

In this study, nanotoxicity tests were made by exposure of Artemia salina to copper (Cu 60-80 nm) and copper oxide (CuO 40 nm) nanoparticles (NPs) at different concentrations (0.2, 1, 5, 10, 25, and 50 mg/l) during some exposure duration. Characterization of Cu and CuO NPswere performed using Transmission Electron Microscope (TEM), Dynamic Light Scattering (DLS), Zeta Potential, X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Fourier Transformation Infrared (FT-IR) analyzes. In organisms, the accumulation and elimination rates of NPs was determined by Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) analysis and the oxidative stress effects on A. salina were determined by Glutathione (GSH) and Thiobarbituric acid reactive substances (TBARS) analysis methods. Both NPs were found to differ in accumulation and elimination rates at each application time and in parallel with the increase in concentration. In each group, it was determined that ion release increased with application time. The results showed that the accumulation rates in Cu NPs had a tendency to increase at 48 h and to decrease at 72 h in concentrations of 0, 2 and 1 mg/l, respectively. And in the all other concentrations have been seen an increasing trend within the time. In the CuO NPs (40nm), accumulation rates were a decrease trend at 48th hour and an increase trend at 72nd hour except 10 mg/l concentration. In the 10 mg/l group was an increase trend with the application period. Cu NP, TBARS value increased with increasing concentrations and the highest increase was observed at 24 h of 5 ppm group. The groups showed a tendency to increase-decrease-increase-decrease in TBARS levels in terms of elapsed time (24th, 48th, 72nd hour and elimination) (5 ppm and 10 ppm groups tended to decrease in TBARS level at 72nd hour). TBARS increased with increasing concentration ratios in CuO NPs (40 nm). (c) 2020 Elsevier B.V. All rights reserved.