Published January 1, 2012 | Version v1
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Comparison of structure and tribological properties of MoS2-Ti films deposited by biased-dc and pulsed-dc

  • 1. Ataturk Univ, Erzurum Coll Vocat, TR-25240 Erzurum, Turkey
  • 2. Ataturk Univ, Dept Mech Engn, TR-25240 Erzurum, Turkey

Description

A closed field unbalanced magnetron sputter (Teer-CFUBMS/550) system was used for the deposition of MoS2-Ti composite coatings on steel substrate (AISI D2) using biased-dc and pulsed-dc. The tribological properties of MoS2-Ti coatings were characterized by pin-on-disc wear tester under atmospheric conditions. Structural analysis was pointed out using X-ray diffraction and SEM-EDS. The microstructure and chemical composition of MoS2-Ti films are very strongly influenced by the sputtering process conditions. While X-ray diffraction pattern of films deposited using pulsed-dc shows mainly (0 0 2) reflections, the films deposited by dc-bias exhibit random orientation being both (0 0 2) and (1 0 0) reflections. Tribological performance of the films deposited using both techniques were compared in view of both crystallographic orientation and Ti content. (C) 2011 Elsevier B.V. All rights reserved.

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