Published January 1, 2019 | Version v1
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Statistical MOSFET Modeling Methodology for Cryogenic Conditions

  • 1. Istanbul Tech Univ, VLSI Lab, Dept Elect & Commun Engn, TR-34469 Istanbul, Turkey

Description

Conventional transistor models are unable to capture the electrical behavior of transistors at cryogenic temperatures. In this paper, a methodology has been developed to calibrate temperature dependence parameters of Berkeley Short-Channel Insulated Gate Field Effect Transistor Model (BSIM3). Rather than modifying BSIM3 equations, the algorithm only changes the values of relevant parameters through noniterative, analytic operations; therefore, it can be implemented in typical circuit simulation tools. Proposed methodology allows to estimate I-D-V-GS and I-D-V-DS curves of the transistors having different channel lengths and widths even under various operating voltages, including the body bias. The parameter extraction algorithm runs with a reasonable computation cost and can compute parameter sets for transistors at user-defined cryogenic conditions.

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